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Proceedings Paper

First realization and characterization of multilayer EUV reflective coatings
Author(s): Piergiorgio Nicolosi; Alessandro Patelli; Maria-Guglielmina Pelizzo; Valentino Rigato; Gianluigi Maggioni; L. Depero; E. Bontempi; G. Mattei; Luca Poletto; Paolo Mazzoldi; Giuseppe Tondello
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Paper Abstract

Experimental results on the realization of Mo/Si multilayer mirrors for EUV applications are presented. The multilayers have been deposited using RF-magnetron sputtering. The characterization of single layers and multilayers has been performed using different physical techniques. The reflectivity of multilayer mirrors optimised for 13 and 19 nm radiation has been measured and compared to simulation.

Paper Details

Date Published: 20 December 2001
PDF: 8 pages
Proc. SPIE 4506, Soft X-Ray and EUV Imaging Systems II, (20 December 2001); doi: 10.1117/12.450947
Show Author Affiliations
Piergiorgio Nicolosi, Univ. degli Studi di Padova and INFM (Italy)
Alessandro Patelli, Univ. degli Studi di Padova and INFM (Italy)
Maria-Guglielmina Pelizzo, Univ. degli Studi di Padova and INFM (Italy)
Valentino Rigato, Lab. Nazionali di Legnaro (Italy)
Gianluigi Maggioni, Lab. Nazionali di Legnaro (Italy)
L. Depero, Univ. degli Studi di Brescia (Italy)
E. Bontempi, Univ. degli Studi di Brescia (Italy)
G. Mattei, Univ. degli Studi di Padova and INFM (Italy)
Luca Poletto, Univ. degli Studi di Padova and INFM (Italy)
Paolo Mazzoldi, Univ. degli Studi di Padova and INFM (Italy)
Giuseppe Tondello, Univ. degli Studi di Padova and INFM (Italy)


Published in SPIE Proceedings Vol. 4506:
Soft X-Ray and EUV Imaging Systems II
Daniel A. Tichenor; James A. Folta, Editor(s)

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