Share Email Print
cover

Proceedings Paper

Liquid-xenon-jet laser-plasma source for EUV lithography
Author(s): Bjoern A. M. Hansson; Lars Rymell; Magnus Berglund; Oscar E. Hemberg; Emmanuelle Janin; Jalmar Thoresen; Hans M. Hertz
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 20 December 2001
PDF: 8 pages
Proc. SPIE 4506, Soft X-Ray and EUV Imaging Systems II, (20 December 2001); doi: 10.1117/12.450943
Show Author Affiliations
Bjoern A. M. Hansson, Royal Institute of Technology and Innolite AB (Sweden)
Lars Rymell, Innolite AB (Sweden)
Magnus Berglund, Innolite AB (Sweden)
Oscar E. Hemberg, Royal Institute of Technology and Innolite AB (Sweden)
Emmanuelle Janin, Innolite AB (Sweden)
Jalmar Thoresen, Innolite AB (Sweden)
Hans M. Hertz, Royal Institute of Technology (Sweden)


Published in SPIE Proceedings Vol. 4506:
Soft X-Ray and EUV Imaging Systems II
Daniel A. Tichenor; James A. Folta, Editor(s)

© SPIE. Terms of Use
Back to Top