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Proceedings Paper

Diffractive lenses for photon energies ranging from the extreme ultraviolet to hard x rays
Author(s): Christian David; Bernd Noehammer; Harun H. Solak; Bianca Haas; Fredy Glaus; J. Friso van der Veen; Volker Schlott; Jeroen Bongaerts; Burkhard Kaulich; Jean Susini
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Paper Abstract

Diffractive optics for the x-ray range have to meet the various requirements of experimental set-ups at synchrotron or other light sources. In the case of focusing elements it is essential that the devices are matched to parameters such as the photon energy and spatial coherence of the source, as well as the required spatial resolution, working distance, and diffraction efficiency. In some cases, a suppression of disturbing diffraction orders requires additional features such as an opaque central stop integrated into the lens. The Laboratory for Micro- and Nanotechnology provides the essential technologies necessary for the design and fabrication of diffractive x-ray lenses for a wide range of photon energies and applications. Over the past years, a large variety of optics tailored to the specific needs of x-ray optical experiments have been fabricated and tested. These include transmission Fresnel phase zone plate for microscopy, microprobe, or beam monitoring applications, as well as condensers to increase the flux in waveguiding experiments in the hard x-ray range. An overview of the nanofabrication technologies and a selection of experiments demonstrating the devices performance are presented.

Paper Details

Date Published: 13 December 2001
PDF: 11 pages
Proc. SPIE 4499, X-Ray Micro- and Nano-Focusing: Applications and Techniques II, (13 December 2001); doi: 10.1117/12.450225
Show Author Affiliations
Christian David, Paul Scherrer Institut (Switzerland)
Bernd Noehammer, Paul Scherrer Institut (Switzerland)
Harun H. Solak, Paul Scherrer Institut (Switzerland)
Bianca Haas, Paul Scherrer Institut (Switzerland)
Fredy Glaus, Paul Scherrer Institut (Switzerland)
J. Friso van der Veen, Paul Scherrer Institut (Switzerland)
Volker Schlott, Paul Scherrer Institut (Switzerland)
Jeroen Bongaerts, Univ. of Amsterdam (France)
Burkhard Kaulich, European Synchrotron Radiation Facility (Italy)
Jean Susini, European Synchrotron Radiation Facility (France)

Published in SPIE Proceedings Vol. 4499:
X-Ray Micro- and Nano-Focusing: Applications and Techniques II
Ian McNulty, Editor(s)

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