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Proceedings Paper

Recent developments in spectroscopic ellipsometry for in-situ applications
Author(s): Blaine D. Johs; Jeff Hale; Natale Joseph Ianno; Craig M. Herzinger; Thomas E. Tiwald; John A. Woollam
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Paper Abstract

The in situ measurement capabilities and advantages of recently developed spectroscopic ellipsometry (SE) instrumentation, which covers wide spectral ranges (190-1700 nm, or 0.73-6.5 eV) and is based on rotating-compensator technology, are described. A technique which can quantitatively correct for window birefringence is presented. Current in situ SE deposition monitoring and control applications in the compound semiconductor, display, and optical coatings industries are also presented.

Paper Details

Date Published: 10 December 2001
PDF: 17 pages
Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); doi: 10.1117/12.450108
Show Author Affiliations
Blaine D. Johs, J.A. Woollam Co., Inc. (United States)
Jeff Hale, J.A. Woollam Co., Inc. (United States)
Natale Joseph Ianno, Univ. of Nebraska/Lincoln (United States)
Craig M. Herzinger, J.A. Woollam Co., Inc. (United States)
Thomas E. Tiwald, J.A. Woollam Co., Inc. (United States)
John A. Woollam, J.A. Woollam Co., Inc. (United States)


Published in SPIE Proceedings Vol. 4449:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II
Angela Duparre; Bhanwar Singh, Editor(s)

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