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Proceedings Paper

Measurement of total integrated scatter of optical coatings for 157-nm lithography
Author(s): Tadahiko Saito; Jun Saito; Etsuro Nakamura; Tatsunobu Kudo; Masanao Kagaya; Tetsuo Takahashi
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Paper Abstract

A new Coblentz type scatterometer is developed for evaluation of 157-nm optical coatings. The Coblentz hemisphere has ellipsoidal design for higher sensitivity and stability. The scatterometer works under nitrogen atmosphere keeping away from the organic contamination. Some kind of antireflective coatings are obtained from several Japanese suppliers and evaluated by the scatterometer. Results of the scatter measurement are almost equal except one sample that includes Na3AlF6 layer as low refractive index material. Its extremely high scatter loss could be ascribed degradation by reaction to the water in the air.

Paper Details

Date Published: 10 December 2001
PDF: 8 pages
Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); doi: 10.1117/12.450106
Show Author Affiliations
Tadahiko Saito, Association of Super-Advanced Electronics Technologies (Japan)
Jun Saito, Association of Super-Advanced Electronics Technologies (Japan)
Etsuro Nakamura, Nikon Corp. (Japan)
Tatsunobu Kudo, Nikon Corp. (Japan)
Masanao Kagaya, Nikon Corp. (Japan)
Tetsuo Takahashi, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 4449:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II
Angela Duparre; Bhanwar Singh, Editor(s)

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