Share Email Print
cover

Proceedings Paper

Measurement of absorptance of optical coatings for F2 lithography
Author(s): Chidane Ouchi; Masanobu Hasegawa; Akira Matsumoto; Kazuho Sone
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

An absorptance measurement system has been developed for evaluation of the absorption loss of optical coatings at the wavelength of F2 laser(157nm). Calorimetry was adopted as measurement method because of its high reliability. In the system, the calorific values generated by irradiation has estimated by comparison with those generated by an electric heater in order to obtain the high accuracy of measurement. The repeatability of measurement has been attained so far to be +/- 0.02%. We have found out with the system that the absorptance is increased by measurement in the vacuum compared with in nitrogen and decreased by irradiation of F2 laser light due to its contamination cleaning effect. We have measured the absorptance of samples with anti-reflection coatings that several suppliers fabricated by their own methods.

Paper Details

Date Published: 10 December 2001
PDF: 6 pages
Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); doi: 10.1117/12.450089
Show Author Affiliations
Chidane Ouchi, Association of Super-Advanced Electronics Technologies (Japan)
Masanobu Hasegawa, Association of Super-Advanced Electronics Technologies (Japan)
Akira Matsumoto, Association of Super-Advanced Electronics Technologies (Japan)
Kazuho Sone, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4449:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II
Angela Duparre; Bhanwar Singh, Editor(s)

© SPIE. Terms of Use
Back to Top