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Proceedings Paper

Automated high-accuracy measuring system for specular microreflectivity
Author(s): Ruediger Grunwald; Stefan Nerreter; Jens Wolfgang Tomm; Sandy Schwirzke-Schaaf; Fabian Doerfel
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Paper Abstract

An automated, compact system for high-accuracy measurements of specular reflectivity at different laser wavelengths (633 nm, 822 nm) on the basis of lock-in technique and LabView has been developed. With a spatial resolution of less than 2 micrometers , a signal resolution of less than 10-4 was obtained. Micro-optical components like microlenses with angular-compensating antireflection coatings, nonuniform micro-mirror arrays, broad-stripe diode laser facets and low-numerical-aperture graded-index microlenses have been characterized by two-dimensional reflectivity mapping. Errors caused by the angular spectrum of the focused polarized probe lasers were analysed.

Paper Details

Date Published: 10 December 2001
PDF: 8 pages
Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); doi: 10.1117/12.450084
Show Author Affiliations
Ruediger Grunwald, Max-Born-Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Stefan Nerreter, Max-Born-Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Jens Wolfgang Tomm, Max-Born-Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Sandy Schwirzke-Schaaf, Max-Born-Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Fabian Doerfel, Univ. of Applied Sciences (Germany)


Published in SPIE Proceedings Vol. 4449:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II
Angela Duparre; Bhanwar Singh, Editor(s)

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