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Proceedings Paper

Present and future industrial metrology needs for qualification of high-quality optical microlithography materials
Author(s): Axel Engel; Ewald Moersen; A. Jordanov; Konrad Knapp
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Paper Abstract

Schott Lithotec is producing and developing the optical materials for the 248-nm, 193-nm and 157-nm lithography technology. 248-nm systems are in use already, the first 193-nm prototype system has been set up and the first 157-nm stepper system is expected to run in 2003. Schott Lithotec provides the Fused Silica and CaF2 materials for these systems both in production and in development. In order to ensure the requirements on transmission and laser durability as well as on homogeneity and birefringence numerous metrology R&D activities have been performed. The requirements on the optical material quality concerning these materials are extremely high and continuously increasing. We present the status of R&D activities for the metrology, which is necessary to demonstrate the improvement of the optical material quality. Based on the forecasts of the semiconductor industry (ITRS, SIA and DATAQUEST Roadmaps), we will derive the needs for metrology in the future.

Paper Details

Date Published: 10 December 2001
PDF: 6 pages
Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); doi: 10.1117/12.450080
Show Author Affiliations
Axel Engel, Schott Lithotec AG (Germany)
Ewald Moersen, Schott Lithotec AG (Germany)
A. Jordanov, Schott Lithotec AG (Germany)
Konrad Knapp, Schott Lithotec AG (Germany)


Published in SPIE Proceedings Vol. 4449:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II
Angela Duparre; Bhanwar Singh, Editor(s)

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