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Proceedings Paper

Low-loss waveguides on silicon substrates for photonic circuits
Author(s): Richard L. Davis; Sae H. Lee
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Paper Abstract

We have developed techniques for fabricating extremely low-loss channel waveguide structures on silicon substrates. We have made and evaluated waveguides consisting of combinations of Corning 7059 glass, phosphorus-doped silica glass (PSG), and boron-doped silica glass (BSG). The waveguides were fabricated on the surfaces of oxidized silicon wafers. The 7059 waveguides were patterned in rf-sputter-deposited films, and the PSG waveguides were made using atmospheric-pressure, chemical vapor deposition (APCVD), low-pressure, chemical vapor deposition (LPCVD), and plasma-enhanced, chemical vapor deposition (PECVD). BSG was used strictly as a cladding layer for many of the waveguides. We present a comparison of the waveguides prepared by these methods, and discuss the processing techniques used to make channel waveguides with propagation losses less than 0.01 dB/cm. The processes we used allowed us to make waveguides with cross-sections ranging from rectangular to nearly circular, and to build multiguide structures with the waveguides stacked vertically or arranged side by side. Applications for these waveguides include low-loss splitters and combiners, high-finesse resonators, switches, and wavelength division multiplexers/demultiplexers.

Paper Details

Date Published: 1 September 1991
PDF: 7 pages
Proc. SPIE 1474, Optical Technology for Signal Processing Systems, (1 September 1991); doi: 10.1117/12.44907
Show Author Affiliations
Richard L. Davis, Northrop Research and Technology Ctr. (United States)
Sae H. Lee, Northrop Research and Technology Ctr. (United States)


Published in SPIE Proceedings Vol. 1474:
Optical Technology for Signal Processing Systems
Mark P. Bendett, Editor(s)

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