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Proceedings Paper

MEMS applications of porous silicon
Author(s): Wolfgang Benecke; Alexandra Splinter
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Paper Abstract

Porous silicon fabricated by partial electrochemical dissolution of bulk silicon, shows outstanding material properties. The nanostructure of the remaining Si-skeleton is used for specific optical devices, such as emitters and filters. The high internal surface of the material opens new opportunities for different types of microsensors and -actuators and microsystem concepts. The porous layers can be used as sacrificial layers due to the high reactivity of the material which leads to a new class of micromachined MEMS devices. A brief overview on the historic evolution of the material is given. The base technologies for the fabrication of porous silicon layers are described. An overview on specific applications is given to demonstrate the potential of the material and the technology behind.

Paper Details

Date Published: 21 November 2001
PDF: 12 pages
Proc. SPIE 4592, Device and Process Technologies for MEMS and Microelectronics II, (21 November 2001); doi: 10.1117/12.449009
Show Author Affiliations
Wolfgang Benecke, Univ. of Bremen (Germany)
Alexandra Splinter, Univ. of Bremen (Germany)

Published in SPIE Proceedings Vol. 4592:
Device and Process Technologies for MEMS and Microelectronics II
Jung-Chih Chiao; Lorenzo Faraone; H. Barry Harrison; Andrei M. Shkel, Editor(s)

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