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Proceedings Paper

Fabrication of high-aspect-ratio precision MEMS with LIGA using synchrotron radiation
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Paper Abstract

LIGA is a microfabrication technology that enables the fabrication of ultraprecise deep microstructures, from hundreds to thousands of micrometers thick, with lateral dimensions in the micrometer range, and submicron tolerances in a variety of materials. It is a sequence of process steps combining deep X-ray lithography, plating-through-mask and replication. The first step of deep lithography in thick resist using synchrotron radiation will be emphasized. The replication techniques extend the applicability of LIGA by offering a broad spectrum of materials but also by allowing for low-cost volume application. Key technological areas receiving attention are materials base expansion, multi-level processing, formation of complex shapes, and assembly.

Paper Details

Date Published: 21 November 2001
PDF: 12 pages
Proc. SPIE 4592, Device and Process Technologies for MEMS and Microelectronics II, (21 November 2001); doi: 10.1117/12.448957
Show Author Affiliations
Chantal G. Khan Malek, Univ. Paris-Sud (France)


Published in SPIE Proceedings Vol. 4592:
Device and Process Technologies for MEMS and Microelectronics II
Jung-Chih Chiao; Lorenzo Faraone; H. Barry Harrison; Andrei M. Shkel, Editor(s)

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