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Proceedings Paper

Novel design and fabrication of Si optical bench
Author(s): Hyung Choi; Jin Hwan Kim; Sang-Chae Kim; Sungchul Kim; Yong Sung Kim; Byeong Cheon Koh
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Paper Abstract

The insertion loss is highly affected by the optical path length for 2D or matrix type free space optical switch. Since the v-groove width of conventional Si optical bench is more than 25% larger than the diameter of lens, it is almost impossible to make the optical bench that has the smaller lens pitch than its diameter. In addition, owing to 'convex corner effect', the completed optical bench has the different etched pattern than expected which also makes it difficult to align the optical components. In this paper, novel design and fabrication of Si optical bench is proposed to solve these problems. We arranged the lenses meanderingly so the lens pitch could be shortened remarkably. New method to make perfect optical bench by wet etch and deep RIE process is also proposed. To compare the simulation result with the experimental one, we made the in-line type optical bench. Its maximum optical path is about 38 mm which is the same as that of the proposed 16x16 free space optical switch. From the optical simulation, the insertion loss is less than 2 dB and it agrees with the measured value within the experimental error.

Paper Details

Date Published: 19 November 2001
PDF: 8 pages
Proc. SPIE 4593, Design, Characterization, and Packaging for MEMS and Microelectronics II, (19 November 2001); doi: 10.1117/12.448844
Show Author Affiliations
Hyung Choi, Samsung Advanced Institute of Technology (South Korea)
Jin Hwan Kim, Samsung Advanced Institute of Technology (South Korea)
Sang-Chae Kim, Samsung Advanced Institute of Technology (South Korea)
Sungchul Kim, Samsung Advanced Institute of Technology (South Korea)
Yong Sung Kim, Samsung Advanced Institute of Technology (South Korea)
Byeong Cheon Koh, Samsung Advanced Institute of Technology (South Korea)


Published in SPIE Proceedings Vol. 4593:
Design, Characterization, and Packaging for MEMS and Microelectronics II
Paul D. Franzon; Ajay P. Malshe; Francis E.H. Tay, Editor(s)

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