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Proceedings Paper

Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics
Author(s): Yuzo Mori; Y. Yamauchi; Kazuya Yamamura; Hidekazu Mimura; A. Saito; H. Kishimoto; Y. Sekito; Masahiko Kanaoka; Alexei Souvorov; Makina Yabashi; Kenji Tamasaku; Tetsuya Ishikawa
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Paper Abstract

Plasma CVM (chemical vaporization machining) and EEM (elastic emission machining) systems were developed for coherent X-ray optics fabrication. Figure-correction performances were tested in the spatial wavelength range from submillimeter to several hundreds mm, and those processes were certified to be promising technique to fabricate next-generation mirrors for coherent X-ray beams. A wave-optics simulation code was also developed to feed scientific analysis back to the fabrication technology. A figure measurement technique was also proposed to satisfy the suggestions from the wave-optics simulations. Simulated results indicated the necessity of the figure measurement with subnanometer accuracy having lateral resolution more than submillimeter.

Paper Details

Date Published: 14 November 2001
PDF: 13 pages
Proc. SPIE 4501, X-Ray Mirrors, Crystals, and Multilayers, (14 November 2001); doi: 10.1117/12.448496
Show Author Affiliations
Yuzo Mori, Osaka Univ. (Japan)
Y. Yamauchi, Osaka Univ. (Japan)
Kazuya Yamamura, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
A. Saito, Osaka Univ. (Japan)
H. Kishimoto, Osaka Univ. (Japan)
Y. Sekito, Osaka Univ. (Japan)
Masahiko Kanaoka, Osaka Univ. (Japan)
Alexei Souvorov, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Makina Yabashi, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Kenji Tamasaku, SPring-8/RIKEN---The Institute of Physical and Chemical Research (Japan)
Tetsuya Ishikawa, SPring-8/RIKEN---The Institute of Physical and Chemical Research (Japan)

Published in SPIE Proceedings Vol. 4501:
X-Ray Mirrors, Crystals, and Multilayers
Andreas K. Freund; Tetsuya Ishikawa; Ali M. Khounsary, Editor(s)

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