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Proceedings Paper

Characterization of a broadband multi-keV laser plasma x-ray source for femtosecond time-resolved EXAFS
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Paper Abstract

Recent advances in femtosecond laser plasma x-rays sources have resulted in several experiments to explore the dynamics of physical and chemical processes on the femtosecond time scale. We present our most recent progresses on the development of an intense broadband x-ray source in the multi-keV range, for application to time-resolved EXAFFS experiments. Experiments have been realized with two different CPA laser systems having different pulse durations and characteristics. X-ray emissions in the 5KeV range generated form solid targets with the INRS Nd:Glass laser and the UCSD Ti:Sapphire laser have been characterized through high resolution and time resolved x-ray spectroscopy. The application of this source to time resolved EXAFS measurements with a sub-picosecond time resolution will also be discussed.

Paper Details

Date Published: 14 November 2001
PDF: 7 pages
Proc. SPIE 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II, (14 November 2001); doi: 10.1117/12.448477
Show Author Affiliations
Patrick Forget, INRS-Univ. du Quebec (Canada)
Fabien Dorchies, INRS-Univ. du Quebec (France)
Jean-Claude Kieffer, INRS-Univ. du Quebec (Canada)
Csaba Toth, Univ. of California/San Diego (United States)
Andrea Cavalleri, Univ. of California/San Diego (United States)
Craig W. Siders, Univ. of California/San Diego (United States)
Jeffrey A. Squier, Univ. of California/San Diego (United States)
Olivier Peyrusse, Commissariat a l'Energy Atomique (France)


Published in SPIE Proceedings Vol. 4504:
Applications of X Rays Generated from Lasers and Other Bright Sources II
George A. Kyrala; Jean-Claude J. Gauthier, Editor(s)

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