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Proceedings Paper

Intense XUV source of radiation within the 4- to 45-nm spectral range based on capillary discharge plasmas
Author(s): Alexander P. Shevelko; Larry V. Knight; R. Steven Turley; Oleg F. Yakushev
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Paper Abstract

A compact device, based on fast capillary discharge plasmas, is an intense EUV and soft x-ray source of radiation. Th plasma is created by a discharge of low-inductance capacitors through a gas-filled ceramic capillary. Parameters of the discharge are: maximum current of 25 kA at applied voltage 40 kV, a pulse duration of 20-30 ns at FWHM, and a rise time of 1.5 ns. The soft x-ray and EUV emission of multiply charged ions is investigated using a compact 1 meter grazing incidence spectrometer-monochromator with a constant angle of deviation. The use of various gases allows the observation of XUV spectra in a wide spectral range (4- 45 nm). A Xe-filled capillary discharge shows intense radiation near 13.5 nm - the region of interest for EUV lithography applications. A reflectometer is used for testing grazing incidence gratings.

Paper Details

Date Published: 14 November 2001
PDF: 8 pages
Proc. SPIE 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II, (14 November 2001); doi: 10.1117/12.448459
Show Author Affiliations
Alexander P. Shevelko, P.N. Lebedev Physical Institute (Russia)
Larry V. Knight, Brigham Young Univ. (United States)
R. Steven Turley, Brigham Young Univ. (United States)
Oleg F. Yakushev, P.N. Lebedev Physical Institute (Russia)


Published in SPIE Proceedings Vol. 4504:
Applications of X Rays Generated from Lasers and Other Bright Sources II
George A. Kyrala; Jean-Claude J. Gauthier, Editor(s)

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