Share Email Print

Proceedings Paper

Characterization of laser-induced EUV plasma sources
Author(s): Sebastian Kranzusch; Klaus R. Mann
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A laser-based EUV plasma source is described, which is going to be utilized for characterization of EUV optical components and sensoric devices in the wavelength region from 11 to 13nm. EUV radiation is generated by focusing a Nd:YAG laser into a double stream gas puff target. By the use of different target gases, broadband as well as narrow-band EUV radiation can be obtained. The emission characteristics of the radiation is monitored by the help of different diagnostic tools including a pinhole camera, an EUV spectrometer, and various EUV photodiodes, either directly or after reflection from multilayer mirrors. Moreover, first wavefront measurements of EUV radiation are performed with the help of a specially designed wavefront analyzer based on the Hartmann-Shack principle, which was sensibilized for 13nm radiation. This device can be used as an alternative to interferometric measurements for an assessment of the optical quality of EUV optics, e.g. for at wavelength monitoring of aberrations (including Zernike analysis), as well as for on-line monitoring of heating effects.

Paper Details

Date Published: 14 November 2001
PDF: 7 pages
Proc. SPIE 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II, (14 November 2001); doi: 10.1117/12.448456
Show Author Affiliations
Sebastian Kranzusch, Laser-Lab. Goettingen eV (Germany)
Klaus R. Mann, Laser-Lab. Goettingen eV (Germany)

Published in SPIE Proceedings Vol. 4504:
Applications of X Rays Generated from Lasers and Other Bright Sources II
George A. Kyrala; Jean-Claude J. Gauthier, Editor(s)

© SPIE. Terms of Use
Back to Top