Share Email Print
cover

Proceedings Paper

Absolute EUV yield of laser-irradiated Xe-clusters dependent on pulse width
Author(s): Peter Viktor Nickles; Matthias Schnuerer; Holger Stiel; Ulrich Vogt; Sarkis A. Ter-Avetisyan; Wolfgang Sandner
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Large Xe-clusters have been excited with 50 fs and 2 ps pulses from a Ti:Sa multi - TW laser at 800 nm wavelength. Additionally a 10 ns Nd:YAG laser at 1064 nm wavelength was used to heat Xe-cluster/gas and a liquid Xe-spray target. Absolute yield measurements of EUV-emission in a wavelength range between 10 nm and 15 nm in combination with target variations were carried out. The ps-laser pulse has resulted in about 30 percent enhanced and spatially more uniform EUV-emission compared to fs-laser excitation. Similar emission has been obtained with ns-pulse exposure of different target modifications which also act back to the EUV-source size. Absolute emission efficiencies at 13.4 nm of up to 0.8 percent in 2pi sr and 2.2 percent bandwidth were measured.

Paper Details

Date Published: 14 November 2001
PDF: 8 pages
Proc. SPIE 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II, (14 November 2001); doi: 10.1117/12.448455
Show Author Affiliations
Peter Viktor Nickles, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)
Matthias Schnuerer, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)
Holger Stiel, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)
Ulrich Vogt, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)
Sarkis A. Ter-Avetisyan, Institute for Physical Research (Armenia) (Armenia)
Wolfgang Sandner, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)


Published in SPIE Proceedings Vol. 4504:
Applications of X Rays Generated from Lasers and Other Bright Sources II
George A. Kyrala; Jean-Claude J. Gauthier, Editor(s)

© SPIE. Terms of Use
Back to Top