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Proceedings Paper

Transparent phase-shifting mask with multistage phase shifter and comb-shaped shifter
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Paper Abstract

This paper introduces the novel concepts of 'multistage phase shifter' and 'comb-shaped shifter' for resolving the problems of a transparent type phase shifting mask. The use of a multistage shifter decreases the light intensity dip at the shifter edges. The use of the comb- shaped shifter enables control of the pattern width. The effectiveness of a multistage shifter and a comb-shaped shifter were demonstrated by experiments and simulations. These technologies make it possible to fabricate a wide range of patterns for VLSI using the transparent phase shifting mask.

Paper Details

Date Published: 1 July 1991
PDF: 10 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44832
Show Author Affiliations
Hisashi Watanabe, Matsushita Electronics Corp. (Japan)
Yoshihiro Todokoro, Matsushita Electronics Corp. (Japan)
Yoshihiko Hirai, Matsushita Electric Industrial Co., Ltd. (Japan)
Morio Inoue, Matsushita Electronics Corp. (Japan)


Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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