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Proceedings Paper

New family of 1:1 catadioptric broadband deep-UV high-Na lithography lenses
Author(s): Yudong Zhang; Haixing Zou; ZhiJiang Wang
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Paper Abstract

This family of optical systems is developed from the Wynne-Dyson system, which can be used in UV and deep-UV lithography systems. Its numerical aperture is larger than 0.4, its spectral bandwidth is wide, so the unnarrowed excimer laser or mercury lamp can be used as an illuminator in these lenses and even the through-lens alignment system can be used in the lithography systems in which these lenses are used.

Paper Details

Date Published: 1 July 1991
PDF: 7 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44824
Show Author Affiliations
Yudong Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Haixing Zou, Shanghai Institute of Optics and Fine Mechanics (China)
ZhiJiang Wang, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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