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Proceedings Paper

Multispot scanning exposure system for excimer laser stepper
Author(s): Yasuhiro Yoshitake; Yoshitada Oshida; Tetsuzou Tanimoto; Minoru Tanaka; Minoru Yoshida
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Paper Abstract

A new type of spot scanning exposure system has been developed for an excimer laser stepper. To optimize exposure parameters, the authors developed a SIPSE (Simulator for Spot Scanning Exposure) and performed experiments with a He-Cd laser and a g-line lens. Applying the results, a prototype of an excimer laser exposure system was developed. A lens evaluation system has also been developed to adjust the lens elements in the projection lens. Using these systems, 0.35 micron line and space patterns were clearly resolved. SIPSE will be usable to optimize a phase-shifting exposure system with a potential for 0.25 micron patterns.

Paper Details

Date Published: 1 July 1991
PDF: 10 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44823
Show Author Affiliations
Yasuhiro Yoshitake, Hitachi, Ltd. (Japan)
Yoshitada Oshida, Hitachi, Ltd. (Japan)
Tetsuzou Tanimoto, Hitachi, Ltd. (Japan)
Minoru Tanaka, Hitachi, Ltd. (Japan)
Minoru Yoshida, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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