Share Email Print

Proceedings Paper

Argon fluoride excimer laser source for sub-0.25 mm optical lithography
Author(s): Richard L. Sandstrom
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The spectral characteristics of an ELS-4000 excimer laser operating at 193 nm and employing two different line-narrowing schemes have been studied. Partial bandwidth reduction (72 pm FWHM) was achieved using a single dispersive prism. The laser generated an average output power of 4 W, making it a useful source of VUV radiation for broad-band 193 nm lithography. Narrow-band operation (5.5 pm FWHM) was attained using a prism-grating combination. The maximum narrow-band energy was 6 mJ; however, the average power was low (0.6 W). Improvements in the gain generator and optics will be needed to extract higher power levels for narrow-band lithographic applications.

Paper Details

Date Published: 1 July 1991
PDF: 7 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44819
Show Author Affiliations
Richard L. Sandstrom, Cymer Laser Technologies (United States)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

© SPIE. Terms of Use
Back to Top