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Proceedings Paper

Argon fluoride excimer laser source for sub-0.25 mm optical lithography
Author(s): Richard L. Sandstrom
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Paper Abstract

The spectral characteristics of an ELS-4000 excimer laser operating at 193 nm and employing two different line-narrowing schemes have been studied. Partial bandwidth reduction (72 pm FWHM) was achieved using a single dispersive prism. The laser generated an average output power of 4 W, making it a useful source of VUV radiation for broad-band 193 nm lithography. Narrow-band operation (5.5 pm FWHM) was attained using a prism-grating combination. The maximum narrow-band energy was 6 mJ; however, the average power was low (0.6 W). Improvements in the gain generator and optics will be needed to extract higher power levels for narrow-band lithographic applications.

Paper Details

Date Published: 1 July 1991
PDF: 7 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44819
Show Author Affiliations
Richard L. Sandstrom, Cymer Laser Technologies (United States)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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