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Proceedings Paper

RF magnetron sputtering SiOx, ZnS, and Al2O3 films for capsulation of nanostructured porous silicon
Author(s): Liubomyr S. Monastyrskii; Roman M. Kovtun; Andrii P. Vlasov; Sergii O. Kostukevich
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Paper Abstract

We were investigated photoemission properties of porous silicon capsulated by thin films SiOx,ZnS,Al2O3. This films were deposited by RF magnetron sputtering in argon-oxygen atmosphere and had crystalline structure. Light-emission spectra such double structure in visible and infra-red region were investigated.

Paper Details

Date Published: 12 November 2001
PDF: 5 pages
Proc. SPIE 4454, Materials for Infrared Detectors, (12 November 2001); doi: 10.1117/12.448181
Show Author Affiliations
Liubomyr S. Monastyrskii, I. Franko National Univ. of Lviv (Ukraine)
Roman M. Kovtun, I. Franko National Univ. of Lviv (Ukraine)
Andrii P. Vlasov, I. Franko National Univ. of Lviv (Ukraine)
Sergii O. Kostukevich, I. Franko National Univ. of Lviv (Ukraine)


Published in SPIE Proceedings Vol. 4454:
Materials for Infrared Detectors
Randolph E. Longshore, Editor(s)

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