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Proceedings Paper

Comparison of 248-nm line narrowing resonator optics for deep-UV lithography lasers
Author(s): Hans-Juergen Kahlert; Ulrich Rebhan; Peter Lokai; Dirk Basting
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Paper Abstract

Since 1987 commercial line narrowed 248 nm excimer lasers have been used with R&D DUV steppers. Several resonator concepts were employed to match linewidth power and lifetime needs for a DUV microlithography laser light source. The physics of different line narrowing resonators like prisms, grating, etalons and combinations are described and experimental lifetime and power capabilities reviewed. The directions of DUV-laser light source development are discussed in regard to 193 and 157 nm lithography.

Paper Details

Date Published: 1 July 1991
PDF: 6 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44818
Show Author Affiliations
Hans-Juergen Kahlert, Lambda Physik GmbH (Germany)
Ulrich Rebhan, Lambda Physik GmbH (Germany)
Peter Lokai, Lambda Physik GmbH (Germany)
Dirk Basting, Lambda Physik GmbH (Germany)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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