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Proceedings Paper

High-sensitivity (25-um pitch) microbolometer FPAs
Author(s): Daniel F. Murphy; Michael Ray; Richard Wyles; James F. Asbrock; Nancy A. Lum; Adam Kennedy; Jessica Wyles; C. Hewitt; Glen E. Graham; Tad Horikiri; John Steven Anderson; Daryl Bradley; Richard Chin; Thomas Kostrzewa
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Paper Abstract

RIO has achieved a significant technical breakthrough in uncooled FPAs by reducing the pixel size by a factor of two while maintaining state-of-the-art sensitivity. Raytheon has produced high-quality 320 by 240 micro bolometer FPAs with 25 micrometers pitch pixels. The 320 by 240 FPAs have a sensitivity that is comparable to micro bolometer FPAs with 50 micrometers pixels. The average NETD value for these FPAs is about 35 mK with an f/1 aperture and operating at 30 Hz frame rates. Good pixel operability and excellent image quality have been demonstrated. Pixel operability is greater than 99 percent on some FPAs, and uncorrected responsivity nonuniformity is less than 4 percent. The micro bolometer detectors also have a relatively fast thermal time constant of approximately 10 msec. This state-of-the-art performance has been achieved as a result of an advanced micromachining fabrication process. The process allows maximization of both the thermal isolation and the optical fill-factor. The reduction in pixel size offers several potential benefits for IR systems. For a given system resolution requirement, the 225 micrometers pixels allow a factor of two reduction in both the focal length and aperture size of the sensor optics. The pixel size reduction facilitates a significant FPA cost reduction since the number of die printed on a wafer can be increased. The pixel size reduction has enabled the development of a large-format 640 by 512 FPA array applicable to wide-field-of-view, long range surveillance and targeting missions, and a 160 by 128 array where applications for miniaturization and temperature invariance are required as well as low cost and low power.

Paper Details

Date Published: 12 November 2001
PDF: 13 pages
Proc. SPIE 4454, Materials for Infrared Detectors, (12 November 2001); doi: 10.1117/12.448169
Show Author Affiliations
Daniel F. Murphy, Raytheon Infrared Operations (United States)
Michael Ray, Raytheon Infrared Operations (United States)
Richard Wyles, Raytheon Infrared Operations (United States)
James F. Asbrock, Raytheon Infrared Operations (United States)
Nancy A. Lum, Raytheon Infrared Operations (United States)
Adam Kennedy, Raytheon Infrared Operations (United States)
Jessica Wyles, Raytheon Infrared Operations (United States)
C. Hewitt, Raytheon Infrared Operations (United States)
Glen E. Graham, Raytheon Infrared Operations (United States)
Tad Horikiri, Raytheon Infrared Operations (United States)
John Steven Anderson, Raytheon Electronic Systems (United States)
Daryl Bradley, Raytheon Electronic Systems (United States)
Richard Chin, Raytheon Electronic Systems (United States)
Thomas Kostrzewa, Raytheon Electronic Systems (United States)


Published in SPIE Proceedings Vol. 4454:
Materials for Infrared Detectors
Randolph E. Longshore, Editor(s)

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