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Proceedings Paper

Results of photolithographic cluster cells in actual production
Author(s): Sandra Clifford; Bruce L. Hayes; Richard Brade
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Paper Abstract

This paper describes a photolithography work cell approach and multiprobe yield results of this cell in a production environment. Important items for design of such lithographic cluster tools are discussed. The cell concept has been proven to accomplish many of the fundamental requirements for cluster processing and has been shown to provide many of the expected advantages. Texas Instrument's experience with this cell concept showed monthly multiprobe yield improvements of 1-10% with an average yield improvement of 4.3%. From a Pareto analysis, it can be seen that the major contribution to the multiprobe yield improvement was a decrease in particulates with under-etch improvements also a major contributor. These improvements were probably due to both resist and develop uniformity improvements.

Paper Details

Date Published: 1 July 1991
PDF: 7 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44815
Show Author Affiliations
Sandra Clifford, FSI International, Inc. (United States)
Bruce L. Hayes, FSI International, Inc. (United States)
Richard Brade, Texas Instruments, Inc. (Germany)


Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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