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Proceedings Paper

Primary research for mechanism of forming PLH
Author(s): Lurong Guo; Xiao-Chun Zhang; Yongkang Guo
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Paper Abstract

This paper presents the primary research mechanism of forming a photolithographic hologram (PLH), and emphatically points out that in the course of the etching process, the etch gases react with the photoresist (PR) and substrate under it simultaneously until the relief patterns on the PR have been transferred completely and PL comes out.

Paper Details

Date Published: 1 July 1991
PDF: 5 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44813
Show Author Affiliations
Lurong Guo, Sichuan Univ. (China)
Xiao-Chun Zhang, Sichuan Univ. (China)
Yongkang Guo, Sichuan Univ. (China)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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