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Proceedings Paper

Overlay and matching strategy for large-area lithography
Author(s): David S. Holbrook; J. Casey Donaher
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Paper Abstract

The MRS PanelPrinterTM can provide image field stitching, overlay, and matching performance suitable for fabrication of large area electronic devices in a multi-machine environment. The methods employed to measure these issues and techniques of stepper self- metrology are presented. Additionally provided are the lithographic results obtained when system parameters are optimized based on these methods.

Paper Details

Date Published: 1 July 1991
PDF: 12 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44807
Show Author Affiliations
David S. Holbrook, MRS Technology, Inc. (United States)
J. Casey Donaher, MRS Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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