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Proceedings Paper

Lithographic simulation: a review
Author(s): Chris A. Mack
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Paper Abstract

A review of the current state of the art in optical and electron beam lithography simulation is presented. Basic physical models are described and examples are given. In addition, rigorous electromagnetic simulation for mask topography is shown and the use of statistical modeling to predict feature size distributions in manufacturing is described. Finally, numerous examples of the use of lithography simulation and its impact on the semiconductor industry are offered.

Paper Details

Date Published: 9 November 2001
PDF: 14 pages
Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, (9 November 2001); doi: 10.1117/12.448059
Show Author Affiliations
Chris A. Mack, KLA-Tencor Corp., FINLE Division (United States)

Published in SPIE Proceedings Vol. 4440:
Lithographic and Micromachining Techniques for Optical Component Fabrication
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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