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Proceedings Paper

Fabrication of aspherical microlenses in fused silica and silicon
Author(s): Reinhard Voelkel; Martin Eisner; Kenneth J. Weible
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Paper Abstract

We report on the fabrication of aspherical refractive microlens arrays on 8'' fused silica and silicon wafers at Suss Neuchatel, Switzerland. Refractive, plano-convex microlenses are fabricated by using photolithography, a reflow or melting resist technique and reactive ion etching. Diffraction-limited optical performance of the microlenses is achieved for refractive microlenses from 100 microns to 1.5 mm diameter and 2 to 50 microns sag. Aspherical lens profiles (aspherical constant from k equals -0.5 to -5.2) are obtained by varying the etch parameters during the reactive ion etching transfer. Microlens arrays in fused silica and silicon are fabricated for high-efficient fiber coupling and telecommunication. Densely packed arrays of cylindrical lenses (packing density > 98%, parabolic profile) are fabricated for flattop illumination at UV-wavelengths. Excellent array uniformity of is required for microlenses used within Microlens Projection Lithography systems.

Paper Details

Date Published: 9 November 2001
PDF: 4 pages
Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, (9 November 2001); doi: 10.1117/12.448056
Show Author Affiliations
Reinhard Voelkel, Karl Suss KG Neuchatel (Switzerland)
Martin Eisner, Karl Suss KG Neuchatel (Switzerland)
Kenneth J. Weible, Weible OpTech (Switzerland)


Published in SPIE Proceedings Vol. 4440:
Lithographic and Micromachining Techniques for Optical Component Fabrication
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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