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Proceedings Paper

Precise proximity correction for fabricating chirped diffraction gratings with direct-writing electron-beam lithography
Author(s): Masato Okano; Tsutomu Yotsuya; Yoshihiko Hirai; Hisao Kikuta; Kazuya Yamamoto
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Paper Abstract

Proximity correction is an important technique to fabricate diffractive optical elements with the direct-writing electron-beam lithography. For the precise proximity correction, the absorbed energy distribution is calculated with an electron scatter simulator based on the Monte Carlo method, and a resist profile is estimated with a resist development simulator based on the cell removal model. In this paper, we calculated the optimum electron dosage for a chirped-period diffraction grating by use of such a precise proximity correction. To reduce the calculation time, we set the cell size 200nmx200nm. The resultant resist profile, however, was much more precise than the cell size because of the interpolation. It took 24 hours to optimize the electron dosage of a grating with a width of 5mm and the minimum grating period of 4micrometers . Moreover the grating, which was fabricated according to the calculated dosage, had a profile that agreed well with the calculated profile.

Paper Details

Date Published: 9 November 2001
PDF: 9 pages
Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, (9 November 2001); doi: 10.1117/12.448048
Show Author Affiliations
Masato Okano, Osaka Science and Technology Ctr. (Japan)
Tsutomu Yotsuya, Osaka Science and Technology Ctr. (Japan)
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)
Hisao Kikuta, Osaka Prefecture Univ. (Japan)
Kazuya Yamamoto, NALUX Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4440:
Lithographic and Micromachining Techniques for Optical Component Fabrication
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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