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Proceedings Paper

Farbrication of diffractive optical elements on a Si chip by an imprint lithography using nonsymmetrical silicon mold
Author(s): Yoshihiko Hirai; Masato Okano; Takayuki Okuno; Hiroshi Toyota; Tsutomu Yotsuya; Hisao Kikuta; Yoshio Tanaka
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Paper Abstract

Fabrication of a fine diffractive optical element on a Si chip is demonstrated using imprint lithography. A chirped diffraction grating, which has modulated pitched pattern with curved cross section is fabricated by an electron beam lithography, where the exposure dose profile is automatically optimized by computer aided system. Using the resist pattern as an etching mask, anisotropic dry etching is performed to transfer the resist pattern profile to the Si chip. The etched Si substrate is used as a mold in the imprint lithography. The Si mold is pressed to a thin polymer (poly methyl methacrylate) on a Si chip. After releasing the mold, a fine diffractive optical pattern is successfully transferred to the thin polymer. This method is exceedingly useful for fabrication of integrated diffractive optical elements with electric circuits on a Si chip.

Paper Details

Date Published: 9 November 2001
PDF: 10 pages
Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, (9 November 2001); doi: 10.1117/12.448045
Show Author Affiliations
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)
Masato Okano, Osaka Science and Technology Ctr. (Japan)
Takayuki Okuno, Osaka Prefecture Univ. (Japan)
Hiroshi Toyota, Osaka Science and Technology Ctr. (Japan)
Tsutomu Yotsuya, Osaka Prefecture Univ. (Japan)
Hisao Kikuta, Osaka Prefecture Univ. (Japan)
Yoshio Tanaka, Osaka Prefecture Univ. (Japan)


Published in SPIE Proceedings Vol. 4440:
Lithographic and Micromachining Techniques for Optical Component Fabrication
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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