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Proceedings Paper

Minimizing Fizeau fringes during the contact printing of diffraction gratings
Author(s): Dino R. Ciarlo; Michael C. Rushford; Paul J. Kuzmenko; Jian Ge
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Paper Abstract

An index matching fluid has been used to minimize the effect of interference fringes which develop when contact printing diffraction gratings on silicon wafers. These fringes are the result of interference effects when there is a small but uneven gap between the photomask and resist surface. They are especially troublesome when printing and etching large area, coarse diffraction gratings on the surface of silicon wafers and silicon disks.

Paper Details

Date Published: 9 November 2001
PDF: 7 pages
Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, (9 November 2001); doi: 10.1117/12.448041
Show Author Affiliations
Dino R. Ciarlo, Lawrence Livermore National Lab. (United States)
Michael C. Rushford, Lawrence Livermore National Lab. (United States)
Paul J. Kuzmenko, Lawrence Livermore National Lab. (United States)
Jian Ge, The Pennsylvania State Univ. (United States)


Published in SPIE Proceedings Vol. 4440:
Lithographic and Micromachining Techniques for Optical Component Fabrication
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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