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Proceedings Paper

Excimer laser photolithography with a 1:1 broadband catadioptric optics
Author(s): Yudong Zhang; Dunwu Lu; Haixing Zou; ZhiJiang Wang
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Paper Abstract

Design and construction of a deep-UV projection lens for use in sub-micron excimer laser lithography is reported. Its spectral band is wide enough for an unnarrowed excimer laser used as an illumination source.

Paper Details

Date Published: 1 July 1991
PDF: 8 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44804
Show Author Affiliations
Yudong Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Dunwu Lu, Shanghai Institute of Optics and Fine Mechanics (China)
Haixing Zou, Shanghai Institute of Optics and Fine Mechanics (China)
ZhiJiang Wang, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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