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Proceedings Paper

Investigation of self-aligned phase-shifting reticles by simulation techniques
Author(s): Christoph Noelscher; Leonhard Mader
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Paper Abstract

By means of simulation techniques using the SAMPLE and SPLAT programs the potential of self-aligned phase-shifting reticles for applications in microlithography is investigated and compared with conventional reticles and, to some extent, also with alternating and chromeless phase-shifter edge-line reticles. The analysis concentrates on partially coherent imaging ((sigma) equals0.5) of isolated spaces, line/space gratings and contact holes at k1 factors of 0.5 and 0.63, but wider and finer structures are also considered. The resist technique is found to have a considerable influence on the results. The work also includes a rough analysis of the necessary manufacturing tolerances of the phase reticles.

Paper Details

Date Published: 1 July 1991
PDF: 16 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44798
Show Author Affiliations
Christoph Noelscher, Siemens AG (Germany)
Leonhard Mader, Siemens AG (Germany)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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