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Proceedings Paper

Variable phase-shift mask for deep-submicron optical lithography
Author(s): Tsuneo Terasawa; Norio Hasegawa; Akira Imai; Toshihiko P. Tanaka; Souichi Katagiri
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Paper Abstract

A variable phase-shift mask for optical lithography, which gives several kinds of optical phase shifting to light transmitted through the mask apertures, is proposed, and image quality obtained with this mask is investigated. Clear regions with some optical phase shiftings between 0 degree(s) and 180 degree(s) are inserted between the two connected apertures, which are 180 degree(s) out of phase. The role of these inserted regions is to decrease the dip in intensity distribution, which is occasionally needed for producing complicated features. The advantages of this variable phase-shift mask and the effect of wave-front aberrations on imaging characteristics are investigated.

Paper Details

Date Published: 1 July 1991
PDF: 10 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44782
Show Author Affiliations
Tsuneo Terasawa, Hitachi, Ltd. (Japan)
Norio Hasegawa, Hitachi, Ltd. (Japan)
Akira Imai, Hitachi, Ltd. (Japan)
Toshihiko P. Tanaka, Hitachi, Ltd. (Japan)
Souichi Katagiri, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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