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Proceedings Paper

Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications
Author(s): Maaike Op de Beeck; Akira Tokui; Masato Fujinaga; Nobuyuki Yoshioka; Kazuya Kamon; Tetsuro Hanawa; Katsuhiro Tsukamoto
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Paper Abstract

Three types of phase-shifting mask designs are studied with respect to their suitability to print periodical L/S structures. The evaluation criteria are DOF, exposure latitude, linearity, and image contrast and slope of the intensity profile. Mask-making issues are also taken into account. The investigation is based on both simulations and experimental results. A fully transparent shifter causing an optical shift of 180 degrees is considered. A negative tone photoresist is used for the exposures with a KrF excimer laser stepper (248 nm).

Paper Details

Date Published: 1 July 1991
PDF: 17 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44781
Show Author Affiliations
Maaike Op de Beeck, Mitsubishi Electric Corp. (Japan)
Akira Tokui, Mitsubishi Electric Corp. (Japan)
Masato Fujinaga, Mitsubishi Electric Corp. (Japan)
Nobuyuki Yoshioka, Mitsubishi Electric Corp. (Japan)
Kazuya Kamon, Mitsubishi Electric Corp. (Japan)
Tetsuro Hanawa, Mitsubishi Electric Corp. (Japan)
Katsuhiro Tsukamoto, Mitsubishi Electric Corp. (Japan)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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