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Proceedings Paper

Raman spectroscopic investigation of reactively sputtered silver oxide layers: a ready-made silver nanocluster precursor for optical plasmon generation
Author(s): Dorothea Buechel; Christophe Mihalcea; Nobufumi Atoda; Junji Tominaga
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Paper Abstract

Silver oxide layers were prepared by reactive r.f. magnetron sputtering of a silver target in oxygen containing atmosphere. Spectroscopic analysis of the films revealed a gradually composition change from Ag over Ag2O to AgO with increasing oxygen addition. Raman spectroscopy in combination with optical transmission measurements indicated that the AgOx constituents readily decompose by laser irradiation to optically active silver scattering centers and oxygen. Surface enhanced Raman scattering (SERS) of carbon traces in the silver oxide layers verified the potential to excite local surface plasmons in such silver aggregates. Furthermore, SERS activity of the activated layers is demonstrated by the clear amplification of Raman bands of low concentrated chemicals. The example of the model molecule benzoic acid (BA) applied to AgO films on glass substrates allows to observe the activation process in situ. SER characteristics were found to be dependent on the silver oxide film constitution and the state of intermediate silver cluster formation along with the applied photoactivation-time and power.

Paper Details

Date Published: 31 October 2001
PDF: 8 pages
Proc. SPIE 4469, Raman Spectroscopy and Light Scattering Technologies in Materials Science, (31 October 2001); doi: 10.1117/12.447376
Show Author Affiliations
Dorothea Buechel, National Institute of Advanced Industrial Science and Technology (United States)
Christophe Mihalcea, National Institute of Advanced Industrial Science and Technology (Japan)
Nobufumi Atoda, National Institute of Advanced Industrial Science and Technology (Japan)
Junji Tominaga, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 4469:
Raman Spectroscopy and Light Scattering Technologies in Materials Science
David L. Andrews, Editor(s)

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