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Proceedings Paper

Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur
Author(s): Mark J. Davis; Alexander J. Marker III; Lutz Aschke; Fredi Schubert; Ewald Moersen; Heiko Kohlmann; Ina Mitra; Jochen Alkemper; Rudolf W. Mueller; John S. Taylor; Kenneth L. Blaedel; Scott Daniel Hector
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Paper Abstract

Detailed thermal expansion measurements and internal homogeneity measurements of the glass-ceramic material Zerodur were undertaken to examine its usefulness for EUVL. Repeat measurements on 100-mm long samples from three castings exhibit an expansion of approximately 12 +/- 2 ppb/K 2 (sigma) in the temperature range of interest for EUVL, corresponding to Class C of the draft SEMI 3148 standard. Internal homogeneity measurements reveal extremely small refractive index variations, suggesting comparably small compositional variations. This in turn is viewed as a necessary but not sufficient condition for high CTE uniformity, a factor required by EUVL applications.

Paper Details

Date Published: 2 November 2001
PDF: 7 pages
Proc. SPIE 4452, Inorganic Optical Materials III, (2 November 2001); doi: 10.1117/12.446884
Show Author Affiliations
Mark J. Davis, Schott Glass Technologies Inc. (United States)
Alexander J. Marker III, Schott Glass Technologies Inc. (United States)
Lutz Aschke, Schott Lithotec (Germany)
Fredi Schubert, Schott Lithotec (Germany)
Ewald Moersen, Schott Lithotec (Germany)
Heiko Kohlmann, Schott Glas (Germany)
Ina Mitra, Schott Glas (Germany)
Jochen Alkemper, Schott Glas (Germany)
Rudolf W. Mueller, Schott Glas (Germany)
John S. Taylor, Lawrence Livermore National Lab. (United States)
Kenneth L. Blaedel, Lawrence Livermore National Lab. (United States)
Scott Daniel Hector, Motorola (United States)

Published in SPIE Proceedings Vol. 4452:
Inorganic Optical Materials III
Alexander J. Marker III; Mark J. Davis, Editor(s)

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