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Proceedings Paper

Polishing micro-optic components for use in photonic systems
Author(s): Irene M. Peterson
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Paper Abstract

A fundamental understanding of the mechanisms and variables involved in mechanical and chemical material removal can reduce the trail and error involved in designing a polishing schedule. This paper summarizes some key results from the literature on the relationship between damage mechanisms, removal rates, materials properties and polishing machine variables. A case history on development of a schedule for fiber polishing illustrates some practical examples of the challenges encountered, and also discusses the effects of different abrasive materials.

Paper Details

Date Published: 29 October 2001
PDF: 13 pages
Proc. SPIE 4595, Photonic Systems and Applications, (29 October 2001); doi: 10.1117/12.446635
Show Author Affiliations
Irene M. Peterson, Corning Inc. (United States)

Published in SPIE Proceedings Vol. 4595:
Photonic Systems and Applications
Yakov S. Sidorin; Ding Yuan Tang, Editor(s)

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