Proceedings PaperPolishing micro-optic components for use in photonic systems
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A fundamental understanding of the mechanisms and variables involved in mechanical and chemical material removal can reduce the trail and error involved in designing a polishing schedule. This paper summarizes some key results from the literature on the relationship between damage mechanisms, removal rates, materials properties and polishing machine variables. A case history on development of a schedule for fiber polishing illustrates some practical examples of the challenges encountered, and also discusses the effects of different abrasive materials.