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Proceedings Paper

Fabrication of planar waveguides using PECVD/RIE
Author(s): Rod W. Boswell
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Paper Abstract

Existing optical fiber and fiber-device fabrication techniques have been complemented recently by the development of new processes for the fabrication of planar optical waveguides and devices. These processes rely on new forms of plasma reactors and diagnostic systems which allow in-situ control of optical parameters such as refractive index. Recent technical developments in the micro- electronics industry now allow the fabrication of very compact and highly complex optical circuitry which can be produced on a single photonic chip. They also offer the potential to integrate photonic devices with semiconductor sources and detectors to realize a compact, hybrid photonic- optoelectronic chip, complete with fiber pig-tailing. Because of their compactness and potential low cost, these types of photonic chips are attractive components for future high-capacity optical telecommunications and other networks now being planned. This paper presents the general techniques used in the plasma processing of thin films of silicate glasses including Plasma Enhanced Chemical Vapor Deposition and Reactive Ion Etching.

Paper Details

Date Published: 29 October 2001
PDF: 7 pages
Proc. SPIE 4594, Design, Fabrication, and Characterization of Photonic Devices II, (29 October 2001); doi: 10.1117/12.446560
Show Author Affiliations
Rod W. Boswell, Australian National Univ. (Australia)

Published in SPIE Proceedings Vol. 4594:
Design, Fabrication, and Characterization of Photonic Devices II
Marek Osinski; Soo-Jin Chua; Akira Ishibashi, Editor(s)

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