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Proceedings Paper

Fabrication of submicron-sized structures on hybrid sol-gel glass with electron-beam lithography
Author(s): HongJin Jiang; XiaoCong Yuan; Wai Chye Cheong
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Paper Abstract

An electron-beam sensitive inorganic-organic hybrid SiO2TiO2 glass was synthesized for the fabrication of structures with sub-micron sized features. The sensitivity of the sol-gel material was characterized with the electron beam dosage and the optimized doses were found to cross-link the material for sub-micron structures. Due to its properties of low thermal expansion, good mechanical strength and chemical durability, the sol-gel material can be used as resistance in the dry etching process in optoelectronics fabrications. For micro-optical elements, the diffractive optical elements can be fabricated directly into the sol-gel glass without etching.

Paper Details

Date Published: 29 October 2001
PDF: 6 pages
Proc. SPIE 4594, Design, Fabrication, and Characterization of Photonic Devices II, (29 October 2001); doi: 10.1117/12.446535
Show Author Affiliations
HongJin Jiang, Nanyang Technological Univ. (Singapore)
XiaoCong Yuan, Nanyang Technological Univ. (Singapore)
Wai Chye Cheong, Nanyang Technological Univ. (Singapore)

Published in SPIE Proceedings Vol. 4594:
Design, Fabrication, and Characterization of Photonic Devices II
Marek Osinski; Soo-Jin Chua; Akira Ishibashi, Editor(s)

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