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Proceedings Paper

Study of improvement of imaging quality in project photolithography with amplitude phase compound filtering
Author(s): Xunan Chen; Xiqiao Kang; Xiangang Luo; Jianping Shi
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Paper Abstract

In accordance with the disadvantages of focus depth decrease caused by the large enough numerical aperture of the project photolithography imaging system and larger optical energy loss of amplitude filtering, the improvements in imaging resolution, focus depth and the availability of optical energy by means of amplitude phase compound filtering are studied in detail. The fact that corresponding optimal compound filters should be designed according to the different mask pattern designs has been proposed. The calculation analysis and experimental results show that amplitude phase compound filtering can improve the imaging resolution and focus depth of project photolithography by a big margin. At the same time the availability of optical energy can be improved and this is good for the improvement of production efficiency.

Paper Details

Date Published: 16 October 2001
PDF: 4 pages
Proc. SPIE 4602, Semiconductor Optoelectronic Device Manufacturing and Applications, (16 October 2001); doi: 10.1117/12.445749
Show Author Affiliations
Xunan Chen, Institute of Optics and Electronics (China)
Xiqiao Kang, Institute of Optics and Electronics (China)
Xiangang Luo, Institute of Optics and Electronics (China)
Jianping Shi, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 4602:
Semiconductor Optoelectronic Device Manufacturing and Applications

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