Share Email Print
cover

Proceedings Paper

Exposure uniformity analysis and optimization for scanning mirror system in Hefei lithography beam line
Author(s): Congliang Guo; Chuanshi Yin; Tonghui Liu; Aijuan Zhong; Shinan Qian
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

It is a new technology to use synchrotron radiation lithography for making large scale integral circuit. Synchrotron radiation lithography System is composed of lithography beam line and exposure chamber. A scanning mirror system is making the largest linear exposure area for integrate circuit. By means of increasing control fineness and optimizing scanning frequency in on-line control system, the uniformity of exposure grating is improved quite well. It is opening good idea for every scientist and technician to continue study. It is shown that inspect and control system is still reliable, noise reduced and very convenient after several years operation. It shows operating status of each equipment and vacuum figures on beam line and station, mirror scanning linearity, exposure time, beam current, and so on. Some successful soft X-ray lithography sub-micrometer results are achieved by different users in this system, they are showing very good resolution, more clear leakage and enough depth for example. A convenient and smart optimum analysis system will be developed soon. It is easy to find very good oscillation frequency for mirror vibrating, and the strong interference from current monitor in synchrotron radiation storage ring is reduced very well. Convenient, compact, reliability and safety are the basic but important idea of system design, and what is higher level consideration for getting fine result of micro lithography. There will have enough database space for a different kind user to storage on- line test datum in system.

Paper Details

Date Published: 16 October 2001
PDF: 6 pages
Proc. SPIE 4602, Semiconductor Optoelectronic Device Manufacturing and Applications, (16 October 2001); doi: 10.1117/12.445737
Show Author Affiliations
Congliang Guo, Univ. of Science and Technology of China (China)
Chuanshi Yin, Univ. of Science and Technology of China (China)
Tonghui Liu, Univ. of Science and Technology of China (China)
Aijuan Zhong, Univ. of Science and Technology of China (China)
Shinan Qian, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 4602:
Semiconductor Optoelectronic Device Manufacturing and Applications

© SPIE. Terms of Use
Back to Top