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Proceedings Paper

Control and measuring system for Hefei lithography beam line
Author(s): Congliang Guo; Li Zhu; Tonghui Liu; Jintong Zhan
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Paper Abstract

As one application experiment of the synchrotron radiation, the soft X-ray lithography beam line is an important instrumentation producing a super integrate circuit exposure area that is a large scale. As principle part of the system, shutter and mirror sweep system affect quality of the lithography directly. A convenient and smart control and measuring system for lithography soft X-ray beam line at Hefei National Synchrotron Laboratory had been developed soon after successful storage ring commission. The process control system was composed of monitoring, interlock, data processing, and control. It has been operated so safety and reliability. The measuring and control system is still reliable, noise reduced and very convenient after several years operation. It is the time that the new technology is rapid developed. A site survey of developing computer science, control and measurement method in the world, we need to spend some time to consider old system existed, I think. What are the main questions of the old system in new concept? For putting oneself ahead of thinking how to solve the questions above, We have taken a long time looking for some suitable methods. As we know, the equipment on beam line and station are not changed in general after manufacture. An electronics processing and control method is developed in original system, and system software is advanced, such as new linear drive sub program by using dynamic complete method, noise reduce, on line data processing, and so on.

Paper Details

Date Published: 16 October 2001
PDF: 6 pages
Proc. SPIE 4602, Semiconductor Optoelectronic Device Manufacturing and Applications, (16 October 2001); doi: 10.1117/12.445736
Show Author Affiliations
Congliang Guo, Univ. of Science and Technology of China (China)
Li Zhu, Univ. of Science and Technology of China (China)
Tonghui Liu, Univ. of Science and Technology of China (China)
Jintong Zhan, Univ. of Science and Technology of China (China)

Published in SPIE Proceedings Vol. 4602:
Semiconductor Optoelectronic Device Manufacturing and Applications
David Chen; David Chen; Guo-Yu Wang; Ray T. Chen; Guo-Yu Wang; Chang-Chang Zhu, Editor(s)

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