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Proceedings Paper

Parameter evaluation of photoresist coating model by using orthogonal experiment and regression analysis
Author(s): Ren-Jyh Leu; Yu-Pen Fun; Hung-Chih Chen; Kun-I Lee; Hsiang-Chung Liu
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Paper Abstract

In this paper, we want to optimize photo-resist coating recipe by using orthogonal experiment and statistical regression analysis. We combined two major factors influenced coating performance -- 'wafer coating time' & 'wafer spinning speed' in TRACK unit with IDITM pump dispense recipe. Eventually, IDITM pump dispense recipe contained of four steps dispense time and dispense pressure. By using orthogonal experiment and statistical regression method we obtained set of process parameters which have good predicted performance values. Based on those data, we could apply it on different viscosity type resist to get good coating performance as decreasing resist dispense volume from 3 cc/pcs to 1.6 cc/pcs. Results showed the performance of CD (Critical Dimension) and CP (Chip Probe) yield was comparable to original 3 cc/pcs coating recipe condition. Actually, we could optimize coating recipe to reach resist usage decreasing purpose.

Paper Details

Date Published: 16 October 2001
PDF: 8 pages
Proc. SPIE 4602, Semiconductor Optoelectronic Device Manufacturing and Applications, (16 October 2001); doi: 10.1117/12.445735
Show Author Affiliations
Ren-Jyh Leu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yu-Pen Fun, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Hung-Chih Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Kun-I Lee, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Hsiang-Chung Liu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 4602:
Semiconductor Optoelectronic Device Manufacturing and Applications

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