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Proceedings Paper

Pulsed laser deposition of crystalline carbon nitride thin films at high substrate temperature
Author(s): Guangsheng Fu; Wei Yu; Shu-Fang Wang; Lianshui Zhang; Xiao-Wei Li
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Paper Abstract

Crystalline carbon nitride thin films are synthesized by pulsed XeCl excimer laser deposition technique following by a high temperature annealing or accompanying a pulsed glow discharge plasma assistance. The composition, the structure and the binding state of the deposited films are analyzed by several techniques such as Scanning electron microscopy, Energy-disperse X-ray (EDX), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Experiment results show that the crystalline carbon nitride films preferentially formed at high temperature companying with the nitrogen content reduction and the films graphitization, combining high substrate temperature and nitrogen activation through pulsed discharge is favorable for the formation of (alpha) -C3N4 crystallites.

Paper Details

Date Published: 16 October 2001
PDF: 4 pages
Proc. SPIE 4602, Semiconductor Optoelectronic Device Manufacturing and Applications, (16 October 2001); doi: 10.1117/12.445729
Show Author Affiliations
Guangsheng Fu, Hebei Univ. (China)
Wei Yu, Hebei Univ. (China)
Shu-Fang Wang, Hebei Univ. (China)
Lianshui Zhang, Hebei Univ. (China)
Xiao-Wei Li, Hebei Univ. (China)


Published in SPIE Proceedings Vol. 4602:
Semiconductor Optoelectronic Device Manufacturing and Applications

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