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Proceedings Paper

Fabrication of planar optical waveguide material on silicon by flame hydrolysis deposition
Author(s): Yuanda Wu; Hua Xing; Letian Zhang; Zhongchang Zhuo; Yongshen Yu; Wei Zheng; Guofan Liu; Yushu Zhang
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Paper Abstract

SiO2 thick films were deposited on silicon wafer (2 inches in diameter) as buffer layer for fabricating planar optical wave-guide by flame hydrolysis deposition (FHD) method. The deposition speed is as high as 8μ+m per minute. Then the deposited films were consolidated in electric furnaces in vacuum or air ambience at the temperature of 1380°C. As a result, transparent vitreous silica (or called silica glass) and semi-transparent cristobalite films were obtained. The thickness of the vitreous silica films is up to 40μm, and this kind of films is suitable for buffer layer of planar wave-guide. SiO2 thick films doped with GeO2 were obtained by the same process to fabricate the core layer. Finally, several factors affecting the consolidated silica films were discussed in detail.

Paper Details

Date Published: 19 October 2001
PDF: 6 pages
Proc. SPIE 4580, Optoelectronics, Materials, and Devices for Communications, (19 October 2001); doi: 10.1117/12.444971
Show Author Affiliations
Yuanda Wu, Jilin Univ. (China)
Hua Xing, Jilin Univ. (China)
Letian Zhang, Jilin Univ. (China)
Zhongchang Zhuo, Jilin Univ. (China)
Yongshen Yu, Jilin Univ. (China)
Wei Zheng, Jilin Univ. (China)
Guofan Liu, Jilin Univ. (China)
Yushu Zhang, Jilin Univ. (China)

Published in SPIE Proceedings Vol. 4580:
Optoelectronics, Materials, and Devices for Communications
Tien Pei Lee; Qiming Wang, Editor(s)

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