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Proceedings Paper

High-throughput planer glass coating using Laser Reactive Deposition (LRD)
Author(s): Xiangxin Bi; Ronald Mosso; Shiv Chiruvolu; Eric Euvrard; Michael A. Bryan; Tim Jenks
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Paper Abstract

Planar Lightwave Circuit (PLC) technology has been considered as a promising route to integrate a greater number of channels and more optical functionalities onto a small foot print, enabling smaller device sizes and lower costs of manufacturing by using existing semiconductor process technologies. Among several planar technology platforms, silica-on-silicon technology comprised of a silica higher index core and lower index clad has taken the lead in this direction. One of the major advantages of silica based PLC technology is its relative ease to couple to a single mode silica fiber because of a close match of the index and dimensions of the waveguide core of planar chip and fiber. In this structure, to completely confine and guide light signals, the silica layer stack, including lower clad, core and top clad can be as thick as 20 - 40 microns, in which the core layer thickness is around 6 - 8 micron. This has presented a major challenge to several major silica film deposition technologies including CVD, FHD, PVD, and Sol-Gel processes. In addition to basic requirements for optical quality of the glass film, low cost manufacture also demands a high deposition rate to reduce process costs in the fabrication of these planar chips. In this paper, we present a high throughput and planar glass coating technology to lay down doped and undoped glass films at unprecedented rates. The technology is comprised of a laser reactive deposition (LRDTM) process developed based on our nanoscale particle manufacture (NPMTM) methods pioneered by NanoGram Corporation. We report results on planar glass films deposited using this technology and describe the concepts employed using this technology in manufacturing. Furthermore, we will compare it with various existing glass film deposition technologies.

Paper Details

Date Published: 19 October 2001
PDF: 8 pages
Proc. SPIE 4579, Optical Fiber and Planar Waveguide Technology, (19 October 2001); doi: 10.1117/12.444868
Show Author Affiliations
Xiangxin Bi, NanoGram Corp. (United States)
Ronald Mosso, NanoGram Corp. (United States)
Shiv Chiruvolu, NanoGram Corp. (United States)
Eric Euvrard, NanoGram Corp. (United States)
Michael A. Bryan, NanoGram Corp. (United States)
Tim Jenks, NanoGram Corp. (United States)


Published in SPIE Proceedings Vol. 4579:
Optical Fiber and Planar Waveguide Technology
Shuisheng Jian; Yanming Liu, Editor(s)

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