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Proceedings Paper

Fabrication of a micromold using negative PMER
Author(s): Young Ah Kwon; Kyoung-Soo Chae; Dae Sok Jeoung; Jong Yong Kim; Sung Moon
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Paper Abstract

We fabricated a micro mold using UV-lithography process with a novel mold material, negative PMER. Negative PMER(TOK, PMER N-CA3000) is a chemically amplified negative tone photoresist on a novolak resin base. It can be processed using standard equipment such as standard spin coater, baking with ovens or hotplates, and immersion development tools. Good quality resist patterns of up to 36μm thickness were achieved by means of this equipment in a short time. The conditions of this process were pre-exposure bake of 110 degree(s)C/12min, exposure dose of 675mJ/cm2 post-exposure bake of 100 degree(s)C/9min, and development for 10min.

Paper Details

Date Published: 15 October 2001
PDF: 6 pages
Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); doi: 10.1117/12.444743
Show Author Affiliations
Young Ah Kwon, Korea Institute of Science and Technology (South Korea)
Kyoung-Soo Chae, Korea Institute of Science and Technology (South Korea)
Dae Sok Jeoung, Korea Institute of Science and Technology (South Korea)
Jong Yong Kim, Korea Institute of Science and Technology (South Korea)
Sung Moon, Korea Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 4601:
Micromachining and Microfabrication Process Technology and Devices

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