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Proceedings Paper

Gray-scale mask fabrication system for diffractive micro-optics
Author(s): Shengyi Li; Zhe-hui Lin; Bing Luo; Yi-fan Dai
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Paper Abstract

Gray-scale mask is used to fabricate diffractive optics, which can reduce alignment and etching errors compared with the traditional method and decrease its costs at the same time. This paper presents a new system that is designed to fabricate the gray-scale mask of the binary optical elements. The computer controlled image generation technology is used in this system. After a Spatial Light Modulator modulates the input data generated by computer, more than 256 gray scales are produced. The efficiency is great enhanced because a block of processed image is etched on the mask other than just one pixel every time. To achieve high accuracy in large range, a new kind of drive mechanism is adopted into this system. By using the twist-roller friction drive mechanism and real-time compensation and control, a high accuracy X-Y table can directly realize nanometer order motion resolution smoothly and 50 nanometers positioning accuracy in the system. The accuracy of the moving table is achieved to the extent to connect those figure units together precisely. Our proposal is proved to can achieve both high accuracy and high efficiency in the mask fabrication. Integrated with coping method such as DPE, this technology is very significant in mass production.

Paper Details

Date Published: 15 October 2001
PDF: 5 pages
Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); doi: 10.1117/12.444713
Show Author Affiliations
Shengyi Li, National Univ. of Defense Technology (China)
Zhe-hui Lin, National Univ. of Defense Technology (China)
Bing Luo, National Univ. of Defense Technology (China)
Yi-fan Dai, National Univ. of Defense Technology (China)

Published in SPIE Proceedings Vol. 4601:
Micromachining and Microfabrication Process Technology and Devices
Norman C. Tien; Qing-An Huang, Editor(s)

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